Process / pipelineStatistical circuit analysis
蒙特卡洛工艺变化分析
蒙特卡洛工艺变化分析使用统计抽样来量化制造不确定性对电路性能的影响。随着半导体技术的发展，工艺变化（栅长、氧化层厚度、掺杂剂波动）会在延迟、功耗和漏电方面产生显著的不确定性。蒙特卡洛方法对随机变化空间进行抽样，从而能够对良率、时序裕量和可靠性进行统计表征。这对于现代技术节点至关重要。
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来源
- Fishman, G. S. (1996). Monte Carlo: Concepts, Algorithms, and Applications. Springer-Verlag. DOI: 10.1007/978-1-4757-2553-7 ↗
- Nassif, S. R. (2003). Modeling and analysis of manufacturing variations. In Proc. CICC (pp. 223-228). IEEE. DOI: 10.1109/cicc.2001.929760 ↗
- Agarwal, A., Blaauw, D., Zolotov, V., & Sundareswaran, S. (2005). Statistical timing analysis with dual-Vth devices. IEEE Transactions on VLSI Systems, 13(3), 319-328. link ↗
如何引用本页
ScholarGate. (2026, June 3). Monte Carlo Analysis of Semiconductor Process Variations. ScholarGate. https://scholargate.app/zh/electrical-engineering/monte-carlo-process-variation
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