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| Tinh luyện Rietveld bằng nhiễu xạ tia X (XRD)× | Quang phổ photoelectron tia X× | |
|---|---|---|
| Lĩnh vực | Khoa học vật liệu | Khoa học vật liệu |
| Họ | Process / pipeline | Process / pipeline |
| Năm ra đời≠ | 1969 | 1967 |
| Người khởi xướng≠ | Hugo Rietveld | Kai Siegbahn |
| Loại≠ | Refinement method | Analytical technique |
| Công trình gốc≠ | Rietveld, H. M. (1969). A profile refinement method for nuclear and magnetic structures. Journal of Applied Crystallography, 2(2), 65-71. DOI ↗ | Siegbahn, K., Nordling, C., Fahlman, A., et al. (1967). ESCA: Atomic, Molecular and Solid State Structure Studied by Means of Electron Spectroscopy. Almqvist and Wiksells. link ↗ |
| Tên gọi khác≠ | Rietveld refinement, powder diffraction refinement | XPS, ESCA, electron spectroscopy for chemical analysis |
| Liên quan | 3 | 3 |
| Tóm tắt≠ | XRD Rietveld Refinement is a method for extracting detailed crystal structure information from powder diffraction data by comparing observed and calculated diffraction patterns through least-squares refinement. Developed by Hugo Rietveld in 1969, this technique enables determination of atomic positions, occupancies, thermal parameters, and phase fractions directly from powder data without requiring single crystals. It is the standard approach in materials characterization for structural analysis, phase identification, and quantification. | X-ray Photoelectron Spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is a surface-sensitive analytical technique that measures the kinetic energies of photoelectrons ejected from a material by high-energy X-rays. Developed by Kai Siegbahn in 1967, XPS determines elemental composition, chemical oxidation states, and chemical bonding within ~10 nanometers of a surface. It is indispensable in materials science for surface characterization, corrosion studies, oxide analysis, and interface chemistry. |
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